目录:筱晓（上海）光子技术有限公司>>光学无源器件>>光栅微透镜阵列色散匀化片>> SNS-C20-0808-350-D60-P线性硅纳米印章(纳米图案硅片)（ 光栅/微透镜阵列/光色散/匀化片）
| 产地类别 | 进口 | 价格区间 | 面议 |
|---|---|---|---|
| 应用领域 | 电子/电池,电气,综合 | 组成要素 | 半导体激光器产品及设备 |
线性硅纳米印章(纳米图案硅片)（ 光栅/微透镜阵列/光色散/匀化片）
LightSmyth提供了大量的纳米加工单晶硅衬底，为工业和学术机构提供了一个低成本的纳米光子学研究入口?；卓捎糜诠庋А⒐庾友?、生物学、化学、物理学（如中子散射）、聚合物研究、纳米印迹、微流体学等领域。如果需要，基板可以涂上金属或介质涂层。大多数地表特征具有略微梯形的横截面轮廓，具有直线平行的台地和沟渠。晶格状结构也可用。提供了许多特征尺寸和沟槽深度?；宓纳璧缇低枷窨梢栽谧霸饲芭纳?，以验证准确的轮廓。
Nanopatterned Silicon Stamps
II-VI offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.
Dimensions shown in the table represent target value. Period has accuracy better than 0.5% while groove depth and the width of line and space may differ from the target values by 15%. SEM are given for illustration purposes. If more precise dimensional information is required, we may provide an SEM of the specific piece of nanostamp you order as an optional service
线性硅纳米印章(纳米图案硅片)（ 光栅/微透镜阵列/光色散/匀化片）
5
化工仪器网